Currently, only TSMC and Samsung Foundry are building 3nm smartphone chipsets which currently require the use of Extreme Ultraviolet lithography (EUV) to etch the extremely thin, high-resolution circuitry patterns on silicon wafers. While U.S. sanctions prevent “cutting-edge” chips from being supplied to Huawei by foundries using U.S. technology, there is only one company, ASML, that makes EUV machines and the Dutch have banned the firm from shipping the school-bus-sized machines to Chinese companies.
Huawei hopes that the use of SAQP, multi-patterning, and a DUV lithography machine (pictured) will allow it to obtain 3nm chips
Experts agree that Huawei and its chip manufacturer SMIC might be able to use SAQP, the previous generation’s Deep Ultraviolet Lithography machines, and multiple patterning to produce 5nm chips. However, these experts state that EUV is needed for 3nm silicon. Even then, double-patterning is needed to produce 3nm chips using Low-NA EUV tools. Without making this more complicated than it is already, let’s just say thatΒ Huawei and SMIC believe that with SAQP, they will be able to make 3nm chips using older and less capable DUV machines that were purchased by SMIC before the sanctions took effect.
While the 7nm Kirin 9000s application processor (AP) is two generations behind the 3nm A17 Pro AP that powers the iPhone 15 Pro series, the chip does support 5G which made the Mate 60 line the first Huawei flagship series since 2020’s Mate 40 line to offer Chinese consumers 5G connectivity.
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